Artifact Details

Title

Fok patent notebook (#701)

Catalog Number

102722954

Type

Text

Date

1967-03-27-1968-06-19

Author

Fok, Samuel M.

Biographical Notes

Samuel (Sam) Fok (Ph.D.) worked for Shockley Semiconductor and joined Fairchild in February 1960. Initially he worked as a member of Jay Last’s Micrologic development team on isolation techniques and masking waxes. He developed an IR method to permit alignment of masks required for mechanical isolation from the rear of the wafer. Later he became a specialist in photo resist technology and developed many aspects of masking and photolithography. A Member of the Technical Staff reporting to H. Sello, Manager of the Materials and Processes Deptartment, circa 1966 he was responsible for building the in-house designed Mark III S R (step and repeat) Camera that was used for several years before comparable commercial machines were available. The 1967 organization chart shows him as a Member of the Technical Staff (MTS) reporting to Harry Sello, manager of the Materials and Processes Department. Fok filled 12 notebooks (8 patent books, 4 laboratory books) covering the decade from 1960 to 1970. They contain highly detailed records of his and other departmental activities within the company over this period.

Publisher

Fairchild Semiconductor

Identifying Numbers

Document number 701

Extent

Approximately 100 dated entries over 137 pages.

Dimensions

12 x 10 inches

Description

This patent notebook is identified as #8 on spine. Fok continues his detailed entries on the topics of photo resist technology, lenses and mask making from book #7. It includes a list of completed and planned milestones on the development of the Mark III S R camera (p. 36). As of that date the Y-interferometer was aligned. First references to Projection printing with a demonstration of a Telefunken 2x system. Details of a projection printing project (p. 137).

Category

Notebooks

Collection Title

Fairchild Semiconductor notebooks and technical papers

Publications

The author contributed to the following R&D Technical Reports (TR) and papers in professional publications during his service at Fairchild:

TR45 The Electrochemical Society Meeting (1961-04-30-1961-05-03), Indianapolis (1961-06-01).

TR173 International Conference on Photographic Science and Engineering. (1964-04-27-1964-05-01), New York City (1964-05-15).

TR185 In-house capability of fly's-eye lens technique (1964-08-21).

TR349 Microphoto mask making - present and future (1968-08-12).

Anderson, R. C., Crippen, R. E. and Fok, S. M. Micrologic System Design Considerations. Sixth National Conference on Microelectronics, Washington D.C. (1962-06-25-1962-06-27): Also published as Fairchild TP-22.

Credit

Gift of Texas Instruments Incorporated

Lot Number

X6464.2012