Title
Epitaxial (epi) growth research in complementary metal oxide semiconductor (CMOS) development
Catalog Number
102737295
Type
Document
Description
These folders cover topics including expitaxial thickness in a wafer of semiconducting material, the use of Trichlorosilane in epitaxy, resistivities in epitaxial layers, and membrane technology in epitaxial growth ("membrane epi").
Date
1962-1969; 1976-1984; 1991
Author
Metz, Walter C.
Publisher
Apogee Chemical Inc.; PhilTec Instrument Co.; Digital Equipment Corporation (DEC); Solid State Technology; Lawrence Semiconductor Laboratories Inc.; Bell Telephone Laboratories, Inc.
Category
Article; Memoranda; Notebooks; Promotional Material
Collection Title
Digital Equipment Corporation records
Series Title
Engineers’ papers: Walter Metz papers
Credit
Gift of Hewlett-Packard Company