Diffusion furnace

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Date
1955 ca.
Credit Line
Reprinted with permission of Alcatel-Lucent USA Inc.
Copyright Owner
© Alcatel-Lucent USA Inc.
Object ID
500004322

Calvin Fuller, Carl Frosch and Lincoln Derick, developers of oxide masking techniques at Bell Labs, pose by an early diffusion furnace. Desired impurities contained in high-temperature gases are introduced into semiconductor wafers through openings in the oxide.