Wafers in a diffusion furnace

Prev
Next
Image Zoom
  • Details
  • Description
Date
1972 ca.
Copyright Owner
© National Semiconductor Corporation
Object ID
500004860

Wafers are placed in a high-temperature furnace to diffuse chemical dopants into the silicon in selective areas defined by “windows” etched through the oxide. The windows are defined by exposing light sensitive material coating the surface through the pattern printed on a photo mask.