TitleFok laboratory notebook (ROBE Meetings)
AuthorFok, Samuel M.
Biographical NotesSamuel (Sam) Fok (Ph.D.) worked for Shockley Semiconductor and joined Fairchild in February 1960. Initially he worked as a member of Jay Last’s Micrologic development team on isolation techniques and masking waxes. He developed an IR method to permit alignment of masks required for mechanical isolation from the rear of the wafer. Later he became a specialist in photo resist technology and developed many aspects of masking and photolithography. A Member of the Technical Staff reporting to H. Sello, Manager of the Materials and Processes Deptartment, circa 1966 he was responsible for building the in-house designed Mark III S R (step and repeat) Camera that was used for several years before comparable commercial machines were available. The 1967 organization chart shows him as a Member of the Technical Staff (MTS) reporting to Harry Sello, manager of the Materials and Processes Department. Fok filled 12 notebooks (8 patent books, 4 laboratory books) covering the decade from 1960 to 1970. They contain highly detailed records of his and other departmental activities within the company over this period.
ExtentNumerous entries all dated. Pages are not numbered.
Dimensions10 x 8 inches
DescriptionThis lab-style notebook is titled “KPR ROBE Meeting” on the front cover. KPR is Kodak Photo Resist. Presumably ROBE is an alternate generic acronym for the same topic. It contains detailed notes of action items, problems, schedules and lists of attendees.
Collection TitleFairchild Semiconductor notebooks and technical papers
PublicationsThe author contributed to the following R&D Technical Reports (TR) and papers in professional publications during his service at Fairchild:
TR45 The Electrochemical Society Meeting (1961-04-30-1961-05-03), Indianapolis (1961-06-01).
TR173 International Conference on Photographic Science and Engineering. (1964-04-27-1964-05-01), New York City (1964-05-15).
TR185 In-house capability of fly's-eye lens technique (1964-08-21).
TR349 Microphoto mask making - present and future (1968-08-12).
Anderson, R. C., Crippen, R. E. and Fok, S. M. Micrologic System Design Considerations. Sixth National Conference on Microelectronics, Washington D.C. (1962-06-25-1962-06-27): Also published as Fairchild TP-22.