TitleDowning patent notebook (#732)
DescriptionDescribes processing steps to be performed on experimental wafer runs together with expected outcomes and records of actual results. Includes tests for resistance to radiation also platinum and gold (See TR443 and 485 below) doping experiments. Later pages show weekly schedules of task to be performed.
AuthorDowning, James Philip
Biographical NotesJames (Phil) Downing holds a B.S. (1965) and a Ph.D. (1968) in Electrical Engineering & Computer Sciences from U.C. Berkeley. He joined Fairchild in 1968 where he served in the Surface Physics section managed by E. Snow. He worked at Computer Microtechnology Inc. (CMI) before joining Advanced Micro Devices (AMD) in 1974 as process engineering manager. He served as Managing director of the Bipolar Microprocessor business unit for several years. He left AMD in 1989 to work for Zilog and later at National Semiconductor.
Extent60 dated entries over 107 pages.
Dimensions12 x 10 inches
PatentsThe author is named as inventor on no patents assigned to Fairchild.
Collection TitleFairchild Semiconductor notebooks and technical papers
PublicationsThe author contributed to the following R&D Technical Reports (TR) and papers in professional publications during his service at Fairchild:
TR403 Temperature dependence of hFF – effects of space charge recombination (1969-04-25).
TR443 A preliminary study of the technology for gold doping of silicon devices (1969-11-28).
TR485 Impurity energy levels for platinum in silicon (1970-10-30).
Whittier, R. J. and Downing, J. P., Simple physical model for the injection efficiency of diffused pn-junctions . 1968 International Electron Devices Meeting, vol. 14 (1968): 72.