Artifact Details

Title

Epitaxial (epi) growth research in complementary metal oxide semiconductor (CMOS) development

Catalog Number

102737295

Type

Document

Description

These folders cover topics including expitaxial thickness in a wafer of semiconducting material, the use of Trichlorosilane in epitaxy, resistivities in epitaxial layers, and membrane technology in epitaxial growth ("membrane epi").

Date

1962-1969; 1976-1984; 1991

Author

Metz, Walter C.

Publisher

Apogee Chemical Inc.; PhilTec Instrument Co.; Digital Equipment Corporation (DEC); Solid State Technology; Lawrence Semiconductor Laboratories Inc.; Bell Telephone Laboratories, Inc.

Category

Article; Memoranda; Notebooks; Promotional Material

Collection Title

Digital Equipment Corporation records

Series Title

Engineers’ papers: Walter Metz papers

Credit

Gift of Hewlett-Packard Company

Lot Number

X2675.2004