Epitaxial (epi) growth research in complementary metal oxide semiconductor (CMOS) development
1962-1969; 1976-1984; 1991
Metz, Walter C.
Apogee Chemical Inc.; PhilTec Instrument Co.; Digital Equipment Corporation (DEC); Solid State Technology; Lawrence Semiconductor Laboratories Inc.; Bell Telephone Laboratories, Inc.
These folders cover topics including expitaxial thickness in a wafer of semiconducting material, the use of Trichlorosilane in epitaxy, resistivities in epitaxial layers, and membrane technology in epitaxial growth ("membrane epi").
Article; Memoranda; Notebooks; Promotional Material