Diffusion furnace
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- Details
- Description
- Date
- 1955 ca.
- Credit Line
- Reprinted with permission of Alcatel-Lucent USA Inc.
- Copyright Owner
- © Alcatel-Lucent USA Inc.
- Object ID
- 500004322
Calvin Fuller, Carl Frosch and Lincoln Derick, developers of oxide masking techniques at Bell Labs, pose by an early diffusion furnace. Desired impurities contained in high-temperature gases are introduced into semiconductor wafers through openings in the oxide.
