Wafers in a diffusion furnace
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- Details
- Description
- Date
- 1972 ca.
- Copyright Owner
- © National Semiconductor Corporation
- Object ID
- 500004860
Wafers are placed in a high-temperature furnace to diffuse chemical dopants into the silicon in selective areas defined by “windows” etched through the oxide. The windows are defined by exposing light sensitive material coating the surface through the pattern printed on a photo mask.
